Targets of BaTiO 3 (BT) (50 mm diameter) were prepared starting from BT-commercial powders (99.9%) and particle size of 2 µm, previously dry milled by high energy process (SPEX 8000 mixer mill). The ...
Innovative RF-magnetron sputtering process creates homogenous BaTiO3 films for high-tech electronics
Microstructural characterization of BaTiO3 thin films prepared by RF-Magnetron sputtering using sintered targets from high energy ball milled powders The electronic and optical characteristics of ...
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Pictured is an RF magnetron sputtering system, one of the deposition tools used to make the films in this study. Credit must be given to the creator. Only noncommercial uses of the work are permitted.
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